Thermodynamics Research Center / ThermoML | Journal of Chemical and Engineering Data

Critical Point and Vapor Pressure Measurements for 17 Compounds by a Low Residence Time Flow Method

VonNiederhausern, D. M.[David M.], Wilson, G. M.[Grant M.], Giles, N. F.[Neil F.]
J. Chem. Eng. Data 2006, 51, 6, 1990-1995
ABSTRACT
Critical temperature, critical pressure, and vapor pressure measurements have been performed on 15 compounds by a flow method with ultralow residence times. These compounds are c-butyrolactone, di(propylene glycol), 1,3-butanediol, N-methyldiethanolamine, 4-formylmorpholine, 1,2-epoxy-2-methylpropane, diethyl oxalate, n-butyl acrylate, 2-(2-aminoethoxy)ethanol, tert-butyl acetate, 1,1-ethanediol diacetate, p-diisopropylbenzene, dimethyl disulfide, oxazole, and phenyl isocyanate. Accurate vapor pressure data are also included for di-n-butyl disulfide and sulfolane, but these compounds proved too unstable to directly determine the critical constants using this apparatus.
Compounds
# Formula Name
1 C4H6O2 .gamma.-butyrolactone
2 C6H14O3 4-oxa-1,7-heptanediol
3 C4H10O2 1,3-butanediol
4 C5H13NO2 N-methyldiethanolamine
5 C5H9NO2 N-formylmorpholine
6 C4H8O 2,2-dimethyloxirane
7 C6H10O4 diethyl ethanedioate
8 C7H12O2 butyl 2-propenoate
9 C8H18S2 5,6-dithiadecane
10 C4H11NO2 2-(2-aminoethoxy)ethanol
11 C6H12O2 1,1-dimethylethyl ethanoate
12 C6H10O4 ethylidene diethanoate
13 C12H18 1,4-diisopropylbenzene
14 C2H6S2 2,3-dithiabutane
15 C3H3NO 1,3-oxazole
16 C7H5NO phenyl isocyanate
17 C4H8O2S sulfolane
Datasets
The table above is generated from the ThermoML associated json file (link above). POMD and RXND refer to PureOrMixture and Reaction Datasets. The compound numbers are included in properties, variables, and phases, if specificied; the numbers refer to the table of compounds on the left.
Type Compound-# Property Variable Constraint Phase Method #Points
  • POMD
  • 1
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 1
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 1
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 11
  • POMD
  • 2
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 2
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 2
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 8
  • POMD
  • 3
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 3
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 3
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 9
  • POMD
  • 4
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 4
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 4
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 9
  • POMD
  • 5
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 5
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 5
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 11
  • POMD
  • 6
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 6
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 6
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 8
  • POMD
  • 7
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 7
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 7
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 8
  • POMD
  • 8
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 8
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 8
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 5
  • POMD
  • 9
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 4
  • POMD
  • 10
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 10
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 10
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 9
  • POMD
  • 11
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 11
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 11
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 10
  • POMD
  • 12
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 12
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 12
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 8
  • POMD
  • 13
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 13
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 13
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 8
  • POMD
  • 14
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 14
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 14
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 7
  • POMD
  • 15
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 15
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 15
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 5
  • POMD
  • 16
  • Critical pressure, kPa ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 16
  • Critical temperature, K ; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 1
  • POMD
  • 16
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 6
  • POMD
  • 17
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • Flow apparatus with low residence time
  • 10