Thermodynamics Research Center / ThermoML | Fluid Phase Equilibria

An equipment for dynamic measurements of vapour liquid equilibria and results in binary systems containing cyclohexylamine

Grenner, A.[Andreas], Klauck, M.[Mandy], Schmelzer, J.[Juergen]
Fluid Phase Equilib. 2005, 233, 2, 170-175
ABSTRACT
A computer-aided equipment for precise measurements of vapour liquid equilibrium (VLE) data at normal and low pressures using the dynamic method will be introduced. The apparatus consists of a circulation still which allows isothermal and isobaric measurements. The digital measurement and control system is accomplished by a multimeter coupled with a PC via IEEE-card. The quality of the measurement data is demonstrated by a comparison of the measured vapour pressure data of the pure substances toluene, n-octane and cyclohexylamine with the vapour pressure equation of Daubert and Danner. Furthermore, vapour liquid equilibrium data were measured in the binary systems cyclohexylamine + aniline or water or n-octane. The measured data were regressed according to the activity coefficient models NRTL, UNIQUAC and to the Elliott Suresh Donohue-equation of state (ESD-EOS).
Compounds
# Formula Name
1 C7H8 toluene
2 C8H18 octane
3 C6H13N cyclohexylamine
4 H2O water
5 C6H7N aniline
Datasets
The table above is generated from the ThermoML associated json file (link above). POMD and RXND refer to PureOrMixture and Reaction Datasets. The compound numbers are included in properties, variables, and phases, if specificied; the numbers refer to the table of compounds on the left.
Type Compound-# Property Variable Constraint Phase Method #Points
  • POMD
  • 1
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:32
  • 4
  • POMD
  • 2
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:32
  • 4
  • POMD
  • 3
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:32
  • 4
  • POMD
  • 4
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:8
  • 2
  • POMD
  • 5
  • Vapor or sublimation pressure, kPa ; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:8
  • 2
  • POMD
  • 5
  • 3
  • Vapor or sublimation pressure, kPa ; Liquid
  • Mole fraction - 3; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:8
  • 20
  • POMD
  • 5
  • 3
  • Mole fraction - 3 ; Gas
  • Mole fraction - 3; Liquid
  • Temperature, K; Liquid
  • Gas
  • Liquid
  • Density calibration data
  • 20
  • POMD
  • 3
  • 4
  • Vapor or sublimation pressure, kPa ; Liquid
  • Mole fraction - 4; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:8
  • 23
  • POMD
  • 3
  • 4
  • Mole fraction - 4 ; Gas
  • Mole fraction - 4; Liquid
  • Temperature, K; Liquid
  • Gas
  • Liquid
  • Density calibration data
  • 23
  • POMD
  • 3
  • 2
  • Vapor or sublimation pressure, kPa ; Liquid
  • Mole fraction - 2; Liquid
  • Temperature, K; Liquid
  • Liquid
  • Gas
  • EBULLIO:UFactor:8
  • 26
  • POMD
  • 3
  • 2
  • Mole fraction - 2 ; Gas
  • Mole fraction - 2; Liquid
  • Temperature, K; Liquid
  • Gas
  • Liquid
  • Density calibration data
  • 26